{"id":4075,"date":"2010-01-01T00:00:00","date_gmt":"2009-12-31T23:00:00","guid":{"rendered":"https:\/\/www.ardentis.ch\/publications\/titanium-hydride-and-hydrogen-concentration-in-acid-etched-titanium-and\/"},"modified":"2026-03-10T15:05:15","modified_gmt":"2026-03-10T14:05:15","slug":"titanium-hydride-and-hydrogen-concentration-in-acid-etched-titanium-and","status":"publish","type":"publication","link":"https:\/\/www.ardentis.ch\/en\/publications\/titanium-hydride-and-hydrogen-concentration-in-acid-etched-titanium-and\/","title":{"rendered":"Titanium hydride and hydrogen concentration in acid etched titanium and titanium alloy implants: A comparative analysis of 5 implant systems."},"content":{"rendered":"\n

Authors<\/strong><\/p>\n

Smukler-Moncler S., Bischof M., Nedir R., Ermrich M.<\/p>\n\n

Title<\/strong><\/p>\n

Titanium hydride and hydrogen concentration in acid etched titanium and titanium alloy implants: A comparative analysis of 5 implant systems.<\/p>\n\n

Journal<\/strong><\/p>\n

Clinical Oral Implants Research\n 21(9):944-50, 2010<\/p>\n\n

Link<\/strong><\/p>\n

https:\/\/www.ardentis.ch\/wp-content\/uploads\/2026\/05\/Hydrid-Titanium-in-etched-implants-2009.04.12.pdf<\/a><\/p>\n\n

Abstract<\/strong><\/p>\n

Abstract: Objectives: Acid etching is a popular method to texture the surface of dental implants. During etching, the titanium oxide protective layer is dissolved and small native hydrogen ions diffuse into the unprotected implant surface. They enrich the implant surface with hydrogen and precipitate into titanium hydride (TiH). The aim of this study was to measure the concentration of TiH at the implant surface and the total concentration of Hydrogen at five commercially available implant systems, made of either commercially pure (cp) titanium or titanium alloy.\nMaterial and methods: X-Ray diffraction (XRD) was conducted on each implant system to determine the compounds present at the implant surface. Following a TiH2\/Ti calibration curve, the concentration of TiH was determined. Concentration of hydrogen in the implants was measured by the inert gas fusion thermal conductivity\/infrared detection method.\nResults: XRD data showed that TiH was present on all cp titanium implants but not on the alloyed implants. TiH concentration varied between 5% and 37%. Hydrogen concentration varied between 43 and 108 ppm, no difference in uptake was found between the cp titanium and alloyed implants. Low solubility of hydrogen in a-titanium is responsible for precipitation into TiH. Stronger etching conditions led to higher concentration of TiH2-x.\nConclusion: High solubility of hydrogen in the b-phase of the alloy is preventing hydrogen from precipitating into TiH. All implants, even those lacking TiH at the surface, were enriched with hydrogen. In all implants, hydrogen concentration was within the normative limit of 130 ppm.<\/p>\n\n

Keywords<\/strong><\/p>\n

Keywords\n\nAcid etching, hydrogen concentration, osseotite, sandblasting, SLA, surface treatment, titanium alloy, titanium hydride, X-ray diffraction.<\/p>\n","protected":false},"excerpt":{"rendered":"

Authors Smukler-Moncler S., Bischof M., Nedir R., Ermrich M. Title Titanium hydride and hydrogen concentration in acid etched titanium and titanium alloy implants: A comparative analysis of 5 implant systems. Journal Clinical Oral Implants Research 21(9):944-50, 2010 Link https:\/\/www.ardentis.ch\/wp-content\/uploads\/2026\/05\/Hydrid-Titanium-in-etched-implants-2009.04.12.pdf Abstract Abstract: Objectives: Acid etching is a popular method to texture the surface of dental implants. 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